Fabrication of graded refractive index 3-dimensional anti-reflection structure using self-assembled SiO 2 nano particles

Kentaroh Watanabe, Yasushi Hamamoto, Akio Higo, Masakazu Sugiyama, Yoshiaki Nakano

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    A new fabrication method for graded refractive index anti-reflection structure was proposed. Using self-assembled nano-scale silica particles as an etching mask on the first dielectric layer, an arrayed conic-shaped structure was fabricated. Deposition of second material on that textured dielectric film completed the dual-layer anti-reflection structure. We applied ZnS as the first layer and SiO 2 as the second layer. This fabricated 3-dimensional anti-reflection structure (ARS) demonstrated lower averaged reflectivity than a conventional planar dual-layer anti-reflection coating, the thickness of which had been optimized for a GaAs single-junction PV. The averaged reflectance on the fabricated ARS was 2.58% in the wavelength of 350-850nm demonstrated on the Si substrate. Finally, the ARS was applied to a GaAs single-junction PV, leading to enhanced external quantum efficiency (EQE) which is consistent with the reflectance spectrum.

    Original languageEnglish
    Title of host publicationProgram - 37th IEEE Photovoltaic Specialists Conference, PVSC 2011
    Pages575-578
    Number of pages4
    DOIs
    Publication statusPublished - 2011 Dec 1
    Event37th IEEE Photovoltaic Specialists Conference, PVSC 2011 - Seattle, WA, United States
    Duration: 2011 Jun 192011 Jun 24

    Publication series

    NameConference Record of the IEEE Photovoltaic Specialists Conference
    ISSN (Print)0160-8371

    Other

    Other37th IEEE Photovoltaic Specialists Conference, PVSC 2011
    CountryUnited States
    CitySeattle, WA
    Period11/6/1911/6/24

    ASJC Scopus subject areas

    • Control and Systems Engineering
    • Industrial and Manufacturing Engineering
    • Electrical and Electronic Engineering

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