Fabrication of fully-epitaxial co-{{{2}}}mnsi/ag/co-{{{2}}}mnsi giant magnetoresistive devices by elevated temperature deposition

Yuya Sakuraba, Kennosuke Izumi, Tomoyuki Koganezawa, Subrojati Bosu, Ryo Okura, Masaki Ueda, Takayuki Kojima, Kesami Saito, Koki Takanashi

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

(001)-oriented epitaxial Co-{{2}}MnSi (CMS) films were grown by elevating the substrate temperature during deposition instead of a conventional post-annealing process. The CMS film deposited at 250\circ C showed a very flat surface morphology, large saturation magnetization, and a highly {\rm L2}-{{1}}-ordered crystal structure. A CMS/Ag/CMS giant-magnetoresistive device with CMS layers grown at 250\circ C showed the high magnetoresistance ratio (33%) at room temperature. This ratio was close to that realized in the case of samples fabricated using post-annealing at 500-550 \circ C. The elevated temperature deposition for the Heusler electrodes is a promising method to fabricate a practical magnetic read sensor for next generation hard disc drives without high temperature annealing process over 300\circC.

Original languageEnglish
Article number6549120
Pages (from-to)5464-5468
Number of pages5
JournalIEEE Transactions on Magnetics
Volume49
Issue number11
DOIs
Publication statusPublished - 2013 Nov 14

Keywords

  • CPP-GMR
  • Heusler alloys
  • half-metal
  • spintronics

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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