Fabrication of einzel lens array with one-mask reactive ion etching process for electron micro-optics

Hidetoshi Miyashita, Eiichi Tomono, Yusuke Kawai, Masaya Toda, Masayoshi Esashi, Takahito Ono

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

In this paper, we report the fabrication of electron micro-optics by using deep reactive ion etching of three stacked silicon wafers. The three 120-μm-thick silicon wafers stacked with cavities are etched by a direct cavity through etching technique, where each wafer is bonded with a 200-μm-thick glass with through holes, thus separated by a space in part. An array of the electron micro-optics consisting of three electrodes can be fabricated by a one-mask process without assembling and alignment process. The dimensional profiles of a sample etched using this technique are also investigated. This micro-optics fabrication technology is useful for making future multiple electron beam devices with electron optics.

Original languageEnglish
JournalJapanese journal of applied physics
Volume50
Issue number10 PART 1
DOIs
Publication statusPublished - 2011 Oct

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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