Fabrication of diffraction grating for X-ray Talbot interferometer

Masatake Matsumoto, Kinji Takiguchi, Makoto Tanaka, Yoichi Hunabiki, Hiroaki Takeda, Atsushi Momose, Yuichi Utsumi, Tadashi Hattori

Research output: Contribution to journalArticlepeer-review

27 Citations (Scopus)

Abstract

Imaging technology using the phase data attracts attention from many researchers as the observation technique of a biomechanical material. We produced a diffraction grating for obtaining high-resolution phase data. We designed the new process flow and developed the fabrication technique composed of MEMS technology, X-ray lithography, and micro electroplating. The X-ray lithography process was performed using the NewSUBARU synchrotron radiation facility. The line and the aspect ratio of this grating were 4 μm and above 5 μm, respectively. We evaluated the diffraction grating in SPring-8.

Original languageEnglish
Pages (from-to)543-546
Number of pages4
JournalMicrosystem Technologies
Volume13
Issue number5-6
DOIs
Publication statusPublished - 2007 Mar
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Hardware and Architecture
  • Electrical and Electronic Engineering

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