Fabrication of Co-M-O (M = Ti, Al and Si) granular thin films with giant magnetoresistance by reactive deposition method

Yukio Takeno; Yutaka Shimada

doi:10.1143/jjap.41.1347

Fabrication of Co-M-O (M = Ti, Al and Si) granular thin films with giant magnetoresistance by reactive deposition method

Yukio Takeno, Yutaka Shimada

Research output: Contribution to journal › Article › peer-review

Abstract

Granular Co-M-O (M = Ti, Al and Si) thin films with giant magnetoresistance (GMR) were successfully prepared by the reactive deposition method using an O₂ beam at a highrate of ∼90 nm/min. From fitting of the magnetization curve assuming a log-normal size distribution, average diameters of Co particles were calculated to be 2-3 nm irrespective of the type of oxide matrix. The MR ratios in a field of 19 kOe [MR_r(19kOe)] are found to be 3-9% and there was a tendency of MR_r (M = Si) < MR_r(Al) < MR_r(Ti). In particular, MR_r(M = Ti, 19 kOe) was found to reach a large value of 9.3%.

Original language	English
Pages (from-to)	1347-1348
Number of pages	2
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	41
Issue number	3 A
DOIs	https://doi.org/10.1143/jjap.41.1347
Publication status	Published - 2002 Mar
Externally published	Yes

Keywords

Co-Al-O
Co-Si-O
Co-Ti-O
GMR
Insulating granular system
Log-normal distribution
Molecular beam
Reactive deposition
Superparamagnetism

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/jjap.41.1347

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@article{f4b4f4ffa075484fb2cded0543335150,

title = "Fabrication of Co-M-O (M = Ti, Al and Si) granular thin films with giant magnetoresistance by reactive deposition method",

abstract = "Granular Co-M-O (M = Ti, Al and Si) thin films with giant magnetoresistance (GMR) were successfully prepared by the reactive deposition method using an O2 beam at a highrate of ∼90 nm/min. From fitting of the magnetization curve assuming a log-normal size distribution, average diameters of Co particles were calculated to be 2-3 nm irrespective of the type of oxide matrix. The MR ratios in a field of 19 kOe [MRr(19kOe)] are found to be 3-9% and there was a tendency of MRr (M = Si) < MRr(Al) < MRr(Ti). In particular, MRr(M = Ti, 19 kOe) was found to reach a large value of 9.3%.",

keywords = "Co-Al-O, Co-Si-O, Co-Ti-O, GMR, Insulating granular system, Log-normal distribution, Molecular beam, Reactive deposition, Superparamagnetism",

author = "Yukio Takeno and Yutaka Shimada",

year = "2002",

month = mar,

doi = "10.1143/jjap.41.1347",

language = "English",

volume = "41",

pages = "1347--1348",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "3 A",

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TY - JOUR

T1 - Fabrication of Co-M-O (M = Ti, Al and Si) granular thin films with giant magnetoresistance by reactive deposition method

AU - Takeno, Yukio

AU - Shimada, Yutaka

PY - 2002/3

Y1 - 2002/3

N2 - Granular Co-M-O (M = Ti, Al and Si) thin films with giant magnetoresistance (GMR) were successfully prepared by the reactive deposition method using an O2 beam at a highrate of ∼90 nm/min. From fitting of the magnetization curve assuming a log-normal size distribution, average diameters of Co particles were calculated to be 2-3 nm irrespective of the type of oxide matrix. The MR ratios in a field of 19 kOe [MRr(19kOe)] are found to be 3-9% and there was a tendency of MRr (M = Si) < MRr(Al) < MRr(Ti). In particular, MRr(M = Ti, 19 kOe) was found to reach a large value of 9.3%.

AB - Granular Co-M-O (M = Ti, Al and Si) thin films with giant magnetoresistance (GMR) were successfully prepared by the reactive deposition method using an O2 beam at a highrate of ∼90 nm/min. From fitting of the magnetization curve assuming a log-normal size distribution, average diameters of Co particles were calculated to be 2-3 nm irrespective of the type of oxide matrix. The MR ratios in a field of 19 kOe [MRr(19kOe)] are found to be 3-9% and there was a tendency of MRr (M = Si) < MRr(Al) < MRr(Ti). In particular, MRr(M = Ti, 19 kOe) was found to reach a large value of 9.3%.

KW - Co-Al-O

KW - Co-Si-O

KW - Co-Ti-O

KW - GMR

KW - Insulating granular system

KW - Log-normal distribution

KW - Molecular beam

KW - Reactive deposition

KW - Superparamagnetism

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U2 - 10.1143/jjap.41.1347

DO - 10.1143/jjap.41.1347

M3 - Article

AN - SCOPUS:0036508671

VL - 41

SP - 1347

EP - 1348

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 3 A

ER -

Fabrication of Co-M-O (M = Ti, Al and Si) granular thin films with giant magnetoresistance by reactive deposition method

Abstract

Keywords

ASJC Scopus subject areas

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