Fabrication of Co-M-O (M = Ti, Al and Si) granular thin films with giant magnetoresistance by reactive deposition method

Yukio Takeno, Yutaka Shimada

Research output: Contribution to journalArticlepeer-review

Abstract

Granular Co-M-O (M = Ti, Al and Si) thin films with giant magnetoresistance (GMR) were successfully prepared by the reactive deposition method using an O2 beam at a highrate of ∼90 nm/min. From fitting of the magnetization curve assuming a log-normal size distribution, average diameters of Co particles were calculated to be 2-3 nm irrespective of the type of oxide matrix. The MR ratios in a field of 19 kOe [MRr(19kOe)] are found to be 3-9% and there was a tendency of MRr (M = Si) < MRr(Al) < MRr(Ti). In particular, MRr(M = Ti, 19 kOe) was found to reach a large value of 9.3%.

Original languageEnglish
Pages (from-to)1347-1348
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume41
Issue number3 A
DOIs
Publication statusPublished - 2002 Mar
Externally publishedYes

Keywords

  • Co-Al-O
  • Co-Si-O
  • Co-Ti-O
  • GMR
  • Insulating granular system
  • Log-normal distribution
  • Molecular beam
  • Reactive deposition
  • Superparamagnetism

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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