Fabrication of Co-M-O (M = Ti, Al and Si) granular thin films with giant magnetoresistance by reactive deposition method

Yukio Takeno, Yutaka Shimada

    Research output: Contribution to journal › Article › peer-review

    Abstract

    Granular Co-M-O (M = Ti, Al and Si) thin films with giant magnetoresistance (GMR) were successfully prepared by the reactive deposition method using an O2 beam at a highrate of ∼90 nm/min. From fitting of the magnetization curve assuming a log-normal size distribution, average diameters of Co particles were calculated to be 2-3 nm irrespective of the type of oxide matrix. The MR ratios in a field of 19 kOe [MRr(19kOe)] are found to be 3-9% and there was a tendency of MRr (M = Si) < MRr(Al) < MRr(Ti). In particular, MRr(M = Ti, 19 kOe) was found to reach a large value of 9.3%.

    Original languageEnglish
    Pages (from-to)1347-1348
    Number of pages2
    JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    Volume41
    Issue number3 A
    DOIs
    Publication statusPublished - 2002 Mar

    Keywords

    • Co-Al-O
    • Co-Si-O
    • Co-Ti-O
    • GMR
    • Insulating granular system
    • Log-normal distribution
    • Molecular beam
    • Reactive deposition
    • Superparamagnetism

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

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