Abstract
Granular Co-M-O (M = Ti, Al and Si) thin films with giant magnetoresistance (GMR) were successfully prepared by the reactive deposition method using an O2 beam at a highrate of ∼90 nm/min. From fitting of the magnetization curve assuming a log-normal size distribution, average diameters of Co particles were calculated to be 2-3 nm irrespective of the type of oxide matrix. The MR ratios in a field of 19 kOe [MRr(19kOe)] are found to be 3-9% and there was a tendency of MRr (M = Si) < MRr(Al) < MRr(Ti). In particular, MRr(M = Ti, 19 kOe) was found to reach a large value of 9.3%.
| Original language | English |
|---|---|
| Pages (from-to) | 1347-1348 |
| Number of pages | 2 |
| Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| Volume | 41 |
| Issue number | 3 A |
| DOIs | |
| Publication status | Published - 2002 Mar |
Keywords
- Co-Al-O
- Co-Si-O
- Co-Ti-O
- GMR
- Insulating granular system
- Log-normal distribution
- Molecular beam
- Reactive deposition
- Superparamagnetism
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)
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Takeno, Y., & Shimada, Y. (2002). Fabrication of Co-M-O (M = Ti, Al and Si) granular thin films with giant magnetoresistance by reactive deposition method. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 41(3 A), 1347-1348. https://doi.org/10.1143/jjap.41.1347