Fabrication of carbon nanotube devices by electroplating with in situ observation

F. Wakaya; Y. Ogi; M. Yoshida; S. Kimura; M. Takai; Y. Akasaka; K. Gamo

doi:10.1016/S0167-9317(04)00139-X

Fabrication of carbon nanotube devices by electroplating with in situ observation

F. Wakaya, Y. Ogi, M. Yoshida, S. Kimura, M. Takai, Y. Akasaka, K. Gamo

Research output: Contribution to journal › Conference article

2 Citations (Scopus)

Abstract

Multiwall carbon nanotubes (CNTs) with Au/Ti electrodes were fabricated using electron-beam lithography, lift-off technique and successive electroplating with in situ conductance observation. Two-terminal resistance became dramatically small after the electroplating. This should be due to the small contact resistance between the CNT and the plated metal. The two-terminal resistance after the plating ranged from ≃10 kΩ to some 100 kΩ. At low temperature, low-resistance samples after the plating showed very good ohmic characteristics while high-resistance samples showed Coulomb blockade. A possibility of an in situ length dependence measurement of CNT conductance was demonstrated.

Original language	English
Pages (from-to)	559-563
Number of pages	5
Journal	Microelectronic Engineering
Volume	73-74
DOIs	https://doi.org/10.1016/S0167-9317(04)00139-X
Publication status	Published - 2004 Jun
Externally published	Yes
Event	Micro and Nano Engineering 2003 - Cambridge, United Kingdom Duration: 2003 Sep 22 → 2003 Sep 25

Keywords

Carbon nanotube
Contact resistance
Electroplating

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/S0167-9317(04)00139-X

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Wakaya, F., Ogi, Y., Yoshida, M., Kimura, S., Takai, M., Akasaka, Y., & Gamo, K. (2004). Fabrication of carbon nanotube devices by electroplating with in situ observation. Microelectronic Engineering, 73-74, 559-563. https://doi.org/10.1016/S0167-9317(04)00139-X

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abstract = "Multiwall carbon nanotubes (CNTs) with Au/Ti electrodes were fabricated using electron-beam lithography, lift-off technique and successive electroplating with in situ conductance observation. Two-terminal resistance became dramatically small after the electroplating. This should be due to the small contact resistance between the CNT and the plated metal. The two-terminal resistance after the plating ranged from ≃10 kΩ to some 100 kΩ. At low temperature, low-resistance samples after the plating showed very good ohmic characteristics while high-resistance samples showed Coulomb blockade. A possibility of an in situ length dependence measurement of CNT conductance was demonstrated.",

keywords = "Carbon nanotube, Contact resistance, Electroplating",

author = "F. Wakaya and Y. Ogi and M. Yoshida and S. Kimura and M. Takai and Y. Akasaka and K. Gamo",

year = "2004",

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doi = "10.1016/S0167-9317(04)00139-X",

language = "English",

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pages = "559--563",

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T1 - Fabrication of carbon nanotube devices by electroplating with in situ observation

AU - Wakaya, F.

AU - Ogi, Y.

AU - Yoshida, M.

AU - Kimura, S.

AU - Takai, M.

AU - Akasaka, Y.

AU - Gamo, K.

PY - 2004/6

Y1 - 2004/6

N2 - Multiwall carbon nanotubes (CNTs) with Au/Ti electrodes were fabricated using electron-beam lithography, lift-off technique and successive electroplating with in situ conductance observation. Two-terminal resistance became dramatically small after the electroplating. This should be due to the small contact resistance between the CNT and the plated metal. The two-terminal resistance after the plating ranged from ≃10 kΩ to some 100 kΩ. At low temperature, low-resistance samples after the plating showed very good ohmic characteristics while high-resistance samples showed Coulomb blockade. A possibility of an in situ length dependence measurement of CNT conductance was demonstrated.

AB - Multiwall carbon nanotubes (CNTs) with Au/Ti electrodes were fabricated using electron-beam lithography, lift-off technique and successive electroplating with in situ conductance observation. Two-terminal resistance became dramatically small after the electroplating. This should be due to the small contact resistance between the CNT and the plated metal. The two-terminal resistance after the plating ranged from ≃10 kΩ to some 100 kΩ. At low temperature, low-resistance samples after the plating showed very good ohmic characteristics while high-resistance samples showed Coulomb blockade. A possibility of an in situ length dependence measurement of CNT conductance was demonstrated.

KW - Carbon nanotube

KW - Contact resistance

KW - Electroplating

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