Fabrication of carbon nanotube devices by electroplating with in situ observation

F. Wakaya; Y. Ogi; M. Yoshida; S. Kimura; M. Takai; Y. Akasaka; K. Gamo

doi:10.1016/S0167-9317(04)00139-X

Fabrication of carbon nanotube devices by electroplating with in situ observation

F. Wakaya, Y. Ogi, M. Yoshida, S. Kimura, M. Takai, Y. Akasaka, K. Gamo

High Field Laboratory for Superconducting Materials

Research output: Contribution to journal › Conference article › peer-review

2 Citations (Scopus)

Abstract

Multiwall carbon nanotubes (CNTs) with Au/Ti electrodes were fabricated using electron-beam lithography, lift-off technique and successive electroplating with in situ conductance observation. Two-terminal resistance became dramatically small after the electroplating. This should be due to the small contact resistance between the CNT and the plated metal. The two-terminal resistance after the plating ranged from ≃10 kΩ to some 100 kΩ. At low temperature, low-resistance samples after the plating showed very good ohmic characteristics while high-resistance samples showed Coulomb blockade. A possibility of an in situ length dependence measurement of CNT conductance was demonstrated.

Original language	English
Pages (from-to)	559-563
Number of pages	5
Journal	Microelectronic Engineering
Volume	73-74
DOIs	https://doi.org/10.1016/S0167-9317(04)00139-X
Publication status	Published - 2004 Jun
Event	Micro and Nano Engineering 2003 - Cambridge, United Kingdom Duration: 2003 Sep 22 → 2003 Sep 25

Keywords

Carbon nanotube
Contact resistance
Electroplating

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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@article{2601818fb1604fafba3f73bdd8a81805,

title = "Fabrication of carbon nanotube devices by electroplating with in situ observation",

abstract = "Multiwall carbon nanotubes (CNTs) with Au/Ti electrodes were fabricated using electron-beam lithography, lift-off technique and successive electroplating with in situ conductance observation. Two-terminal resistance became dramatically small after the electroplating. This should be due to the small contact resistance between the CNT and the plated metal. The two-terminal resistance after the plating ranged from ≃10 kΩ to some 100 kΩ. At low temperature, low-resistance samples after the plating showed very good ohmic characteristics while high-resistance samples showed Coulomb blockade. A possibility of an in situ length dependence measurement of CNT conductance was demonstrated.",

keywords = "Carbon nanotube, Contact resistance, Electroplating",

author = "F. Wakaya and Y. Ogi and M. Yoshida and S. Kimura and M. Takai and Y. Akasaka and K. Gamo",

note = "Funding Information: The authors express their thanks to K. Kawasaki for the help with XPS measurements. This work is supported in part by the Grant-in-Aid for Scientific Research on Priority Areas from the Ministry of Education, Culture, Sports, Science and Technology, Japan. One of the authors (F.W.) would like to thank a support by a Grant-in-Aid for Encouragement of Young Scientists from Japan Society for the Promotion of Science.; Micro and Nano Engineering 2003 ; Conference date: 22-09-2003 Through 25-09-2003",

year = "2004",

month = jun,

doi = "10.1016/S0167-9317(04)00139-X",

language = "English",

volume = "73-74",

pages = "559--563",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}

TY - JOUR

T1 - Fabrication of carbon nanotube devices by electroplating with in situ observation

AU - Wakaya, F.

AU - Ogi, Y.

AU - Yoshida, M.

AU - Kimura, S.

AU - Takai, M.

AU - Akasaka, Y.

AU - Gamo, K.

N1 - Funding Information: The authors express their thanks to K. Kawasaki for the help with XPS measurements. This work is supported in part by the Grant-in-Aid for Scientific Research on Priority Areas from the Ministry of Education, Culture, Sports, Science and Technology, Japan. One of the authors (F.W.) would like to thank a support by a Grant-in-Aid for Encouragement of Young Scientists from Japan Society for the Promotion of Science.

PY - 2004/6

Y1 - 2004/6

N2 - Multiwall carbon nanotubes (CNTs) with Au/Ti electrodes were fabricated using electron-beam lithography, lift-off technique and successive electroplating with in situ conductance observation. Two-terminal resistance became dramatically small after the electroplating. This should be due to the small contact resistance between the CNT and the plated metal. The two-terminal resistance after the plating ranged from ≃10 kΩ to some 100 kΩ. At low temperature, low-resistance samples after the plating showed very good ohmic characteristics while high-resistance samples showed Coulomb blockade. A possibility of an in situ length dependence measurement of CNT conductance was demonstrated.

AB - Multiwall carbon nanotubes (CNTs) with Au/Ti electrodes were fabricated using electron-beam lithography, lift-off technique and successive electroplating with in situ conductance observation. Two-terminal resistance became dramatically small after the electroplating. This should be due to the small contact resistance between the CNT and the plated metal. The two-terminal resistance after the plating ranged from ≃10 kΩ to some 100 kΩ. At low temperature, low-resistance samples after the plating showed very good ohmic characteristics while high-resistance samples showed Coulomb blockade. A possibility of an in situ length dependence measurement of CNT conductance was demonstrated.

KW - Carbon nanotube

KW - Contact resistance

KW - Electroplating

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U2 - 10.1016/S0167-9317(04)00139-X

DO - 10.1016/S0167-9317(04)00139-X

M3 - Conference article

AN - SCOPUS:2542427937

VL - 73-74

SP - 559

EP - 563

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

T2 - Micro and Nano Engineering 2003

Y2 - 22 September 2003 through 25 September 2003

ER -