TY - JOUR
T1 - Fabrication of carbon nanotube devices by electroplating with in situ observation
AU - Wakaya, F.
AU - Ogi, Y.
AU - Yoshida, M.
AU - Kimura, S.
AU - Takai, M.
AU - Akasaka, Y.
AU - Gamo, K.
N1 - Funding Information:
The authors express their thanks to K. Kawasaki for the help with XPS measurements. This work is supported in part by the Grant-in-Aid for Scientific Research on Priority Areas from the Ministry of Education, Culture, Sports, Science and Technology, Japan. One of the authors (F.W.) would like to thank a support by a Grant-in-Aid for Encouragement of Young Scientists from Japan Society for the Promotion of Science.
PY - 2004/6
Y1 - 2004/6
N2 - Multiwall carbon nanotubes (CNTs) with Au/Ti electrodes were fabricated using electron-beam lithography, lift-off technique and successive electroplating with in situ conductance observation. Two-terminal resistance became dramatically small after the electroplating. This should be due to the small contact resistance between the CNT and the plated metal. The two-terminal resistance after the plating ranged from ≃10 kΩ to some 100 kΩ. At low temperature, low-resistance samples after the plating showed very good ohmic characteristics while high-resistance samples showed Coulomb blockade. A possibility of an in situ length dependence measurement of CNT conductance was demonstrated.
AB - Multiwall carbon nanotubes (CNTs) with Au/Ti electrodes were fabricated using electron-beam lithography, lift-off technique and successive electroplating with in situ conductance observation. Two-terminal resistance became dramatically small after the electroplating. This should be due to the small contact resistance between the CNT and the plated metal. The two-terminal resistance after the plating ranged from ≃10 kΩ to some 100 kΩ. At low temperature, low-resistance samples after the plating showed very good ohmic characteristics while high-resistance samples showed Coulomb blockade. A possibility of an in situ length dependence measurement of CNT conductance was demonstrated.
KW - Carbon nanotube
KW - Contact resistance
KW - Electroplating
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U2 - 10.1016/S0167-9317(04)00139-X
DO - 10.1016/S0167-9317(04)00139-X
M3 - Conference article
AN - SCOPUS:2542427937
VL - 73-74
SP - 559
EP - 563
JO - Microelectronic Engineering
JF - Microelectronic Engineering
SN - 0167-9317
T2 - Micro and Nano Engineering 2003
Y2 - 22 September 2003 through 25 September 2003
ER -