Fabrication of a two-dimensional diffraction grating with isolated photoresist pattern structures

Hiraku Matsukuma, Masanori Matsunaga, Kai Zhang, Yuki Shimizu, Wei Gao

Research output: Contribution to journalArticlepeer-review

Abstract

This paper presents a fabrication method of a two-dimensional (2D) diffraction grating with isolated photoresist pattern structures in order to reduce fluc-tuation in the grating pitch due to the thermal expan-sion. At first, theoretical calculations for the fabrication of a 2D diffraction grating with isolated pho-toresist pattern structures are carried out to estimate the influences of exposure and development time on the pattern structures to be fabricated through the pattern exposure and development process. A diode laser-based compact non-orthogonal two-axis Lloyd’s mirror interferometer system designed in a size of 500 mm × 840 mm is then built on a breadboard for stable mask-less interference lithography. Basic per-formances of the newly developed compact interfer-ometer system are evaluated through the fabrication of 2D diffraction gratings to demonstrate the feasibil-ity of the theoretical calculations and the developed lithography system.

Original languageEnglish
Pages (from-to)546-551
Number of pages6
JournalInternational Journal of Automation Technology
Volume14
Issue number4
DOIs
Publication statusPublished - 2020

Keywords

  • Isolated photoresist pattern structures
  • Mask-less interference lithography
  • Non-orthogonal two-axis Lloyd’s mirror interferometer
  • Two-dimensional diffraction grating

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering

Fingerprint Dive into the research topics of 'Fabrication of a two-dimensional diffraction grating with isolated photoresist pattern structures'. Together they form a unique fingerprint.

Cite this