Fabrication of a nonvolatile full adder based on logic-in-memory architecture using magnetic tunnel junctions

Nonvolatile logic-in-memory architecture, where nonvolatile memory elements are distributed over a logic-circuit plane, is expected to realize both ultra-low-power and reduced interconnection delay. We have fabricated a nonvolatile full adder based on logic-in-memory architecture using magnetic tunnel junctions (MTJs) in combination with metal oxide semiconductor (MOS) transistors. Magnesium oxide (MgO) barrier MTJs are used to take advantage of their high tunnel magneto-resistance (TMR) ratio and spin-injection write capability. The MOS transistors are fabricated using a 0.18 μm complementary metal oxide semiconductor (CMOS) process. The basic operation of the full adder is confirmed.