Fabrication of a multi-level lens using independent-exposure lithography and FAB plasma etching

Do Kyun Woo, Kazuhiro Hane, Cha Bum Lee, Sun Kyu Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Recently, a micro lens is need for the micro optical system requiring thin thickness. A multi-level lens can be adaptable to satisfy the requirement of this purpose. In this study, an independent-exposure of electron beam lithography and FAB plasma etching method are presented for the fabrication of a multi-level lens. The advantages of the method are the non-repetitive process and the precise fabrication due to the principle of the independent-exposure lithography.

Original languageEnglish
Title of host publication2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS
Pages151-152
Number of pages2
DOIs
Publication statusPublished - 2007 Dec 1
Event2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS - Hualien, Taiwan, Province of China
Duration: 2007 Aug 122007 Aug 16

Publication series

Name2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS

Other

Other2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS
CountryTaiwan, Province of China
CityHualien
Period07/8/1207/8/16

Keywords

  • FAB plasma etching
  • Independent-exposure lithography
  • Multi-level lens
  • Non-repetitive process
  • Proximity effect

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

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