Fabrication of 0.1 μm mosfet with super self-aligned ultrashallow junction electrodes using selective si1-xgex CVD

Junichi Murota, M. Ishii, K. Goto, M. Sakuraba, T. Matsuura, Y. Kudoh, M. Koyanagi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

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Engineering & Materials Science