Fabrication and optical properties of Pb(Mg1/3Nb 2/3)O3-PbTiO3 thin films on Si substrates using the PLD method

Kazuo Shinozaki, Shogo Hayashi, Naoki Wakiya, Takanori Kiguchi, Junzo Tanaka, Nobuo Ishizawa, Keisuke Sato, Masao Kondo, Kazuaki Kurihara

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13 Citations (Scopus)

Abstract

Epitaxial 0.67Pb(Mg1/3Nb2/8)O 3-0.33PbTiO3 (PMN-PT) thin films with electro-optic effects were fabricated on (La0.5Sr0.5)CoO3 (LSCO)/CeO2/YSZ-buffered Si(001) substrates using double-pulse excitation pulsed laser deposition (PLD) method with a mask placed between the target and the substrate. Epitaxial growth of PMN-PT thin films was undertaken using the two-step growth method of PMN-PT film. The PMN-PT seed layer was deposited at 500°C on the LSCO/CeO2/YSZ/Si, which temperature was the same as that used for LSCO deposition. The PMN-PT thin films were deposited on the PMN-PT seed layer at 600°C, which enables growth of high-crystallinity PMN-PT films with smooth surfaces. We obtained optimum fabrication conditions of PMNPT film with micrometer-order thickness. Resultant films showed high crystallinity with full width at half maximum (PWHM) = 0.73 deg and 1.6 μm thickness. Electro-optic properties and the refractive index value were measured at 633 nm wavelength using the prism coupling method. The obtained refractive index was 2.59. The electro-optic coefficients r 13 and r33 were determined by applying the electrical field between a semitransparent, thin top electrode of Pt and a bottom LSCO electrode. The electro-optic coefficient was r13 = 17 pm/V at transverse electric field (TE) mode and r33 = 55 pm/V at transverse magnetic field (TM) mode.

Original languageEnglish
Article number4524977
Pages (from-to)1023-1028
Number of pages6
JournalIEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
Volume55
Issue number5
DOIs
Publication statusPublished - 2008 May

ASJC Scopus subject areas

  • Instrumentation
  • Acoustics and Ultrasonics
  • Electrical and Electronic Engineering

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