Fabrication and microstructural change of PMN-PT thin films on Si substrates by PLD with mask and double-pulse laser excitation

Shogo Hayashi, Naoki Wakiya, Takanori Kiguchi, Junzo Tanaka, Kazuo Shinozaki

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Epitaxial Pb(Mg1/3Nb2/3)O3-PbTiO 3 (PMN-PT) thin films were fabricated on (La,Sr)CoO 3/CeO2/ YSZ coated Si substrates by double-pulse excitation PLD with and without a mask. For double-pulse excitation PLD without a mask in conditions of Nd:YAG laser irradiation before defocused KrF-excimer-laser irradiation, the surface roughness of PMN-PT thin films was rather less than that of the films fabricated using Nd:YAG single laser PLD. Thin films with smoother surfaces were deposited at the high deposition rate of 5.6 nm·min-1 using the mask and the double-pulse excitation PLD method in conditions of irradiation of Nd:YAG laser after KrF excimer laser at 0.5 μs delays.

Original languageEnglish
Pages (from-to)111-114
Number of pages4
JournalKey Engineering Materials
Volume350
DOIs
Publication statusPublished - 2007 Jan 1
Externally publishedYes

Keywords

  • Double-pulse laser excitation
  • Droplet
  • Mask
  • PLD
  • PMN-PT
  • Thin film

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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