Fabrication and in-plane electrical resistivity of Ge/SiGe quantum dot superlattices

K. Hayashi; S. Abiko; N. Motegi; T. Kajitani

doi:10.1109/IMNC.2007.4456153

Fabrication and in-plane electrical resistivity of Ge/SiGe quantum dot superlattices

K. Hayashi, S. Abiko, N. Motegi, T. Kajitani

ENG - Applied Physics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
Pages	160-161
Number of pages	2
DOIs	https://doi.org/10.1109/IMNC.2007.4456153
Publication status	Published - 2007 Dec 1
Event	s20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan Duration: 2007 Nov 5 → 2007 Nov 8

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

Other

Other	s20th International Microprocesses and Nanotechnology Conference, MNC 2007
Country	Japan
City	Kyoto
Period	07/11/5 → 07/11/8

ASJC Scopus subject areas

Hardware and Architecture
Electrical and Electronic Engineering

Access to Document

10.1109/IMNC.2007.4456153

Cite this

Hayashi, K., Abiko, S., Motegi, N., & Kajitani, T. (2007). Fabrication and in-plane electrical resistivity of Ge/SiGe quantum dot superlattices. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC (pp. 160-161). [4456153] (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC). https://doi.org/10.1109/IMNC.2007.4456153

Fabrication and in-plane electrical resistivity of Ge/SiGe quantum dot superlattices. / Hayashi, K.; Abiko, S.; Motegi, N.; Kajitani, T.

Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 160-161 4456153 (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Hayashi, K, Abiko, S, Motegi, N & Kajitani, T 2007, Fabrication and in-plane electrical resistivity of Ge/SiGe quantum dot superlattices. in Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC., 4456153, Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC, pp. 160-161, s20th International Microprocesses and Nanotechnology Conference, MNC 2007, Kyoto, Japan, 07/11/5. https://doi.org/10.1109/IMNC.2007.4456153

Hayashi K, Abiko S, Motegi N, Kajitani T. Fabrication and in-plane electrical resistivity of Ge/SiGe quantum dot superlattices. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 160-161. 4456153. (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC). https://doi.org/10.1109/IMNC.2007.4456153

Hayashi, K. ; Abiko, S. ; Motegi, N. ; Kajitani, T. / Fabrication and in-plane electrical resistivity of Ge/SiGe quantum dot superlattices. Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. pp. 160-161 (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC).

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