Fabrication and evaluation of tunable submicron-thick monocrystalline silicon grating for integration on LSI circuit

T. Sasaki, S. Chernroj, H. Matsuura, K. Hane

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We present a fabrication process and characteristics of tunable submicron-thick monocrystalline silicon grating for integration of LSI wafer. The grating structure was successfully fabricated. The ribbon of the grating was successfully actuated. The rise time of step response was about 20 μs.

Original languageEnglish
Title of host publicationOMN 2015 Jerusalem - 2015 International Conference on Optical MEMS and Nanophotonics, Proceedings
PublisherIEEE Computer Society
ISBN (Electronic)9781467368346
DOIs
Publication statusPublished - 2015 Oct 2
EventInternational Conference on Optical MEMS and Nanophotonics, OMN 2015 - Jerusalem, Israel
Duration: 2015 Aug 22015 Aug 5

Publication series

NameInternational Conference on Optical MEMS and Nanophotonics
Volume02-05-August-2015
ISSN (Print)2160-5033
ISSN (Electronic)2160-5041

Other

OtherInternational Conference on Optical MEMS and Nanophotonics, OMN 2015
CountryIsrael
CityJerusalem
Period15/8/215/8/5

Keywords

  • large scale integration circuit
  • monocrystaline silicon
  • submicron menbrane transfer process
  • tunable grating

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials

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