TY - JOUR
T1 - Fabrication and evaluation of single-crystal-silicon tunable grating using polymer-based membrane transfer bonding process
AU - Chernroj, Sawasdivorn
AU - Onuma, Hisayuki
AU - Suzuki, Tomohiro
AU - Sasaki, Takashi
AU - Matsuura, Hiroshi
AU - Hane, Kazuhiro
N1 - Publisher Copyright:
© 2015 The Institute of Electrical Engineers of Japan.
PY - 2015
Y1 - 2015
N2 - We developed a fabrication process of MEMS tunable grating supported by patterned polymer. The tunable grating was fabricated on single crystal silicon with thickness of 260 nm using membrane transfer bonding technique on glass. To obtain a good defined anchor structure of grating, two kinds of polymers were used for the fabrication of bonded wafer. The characteristic of the tunable grating ribbon was measured. The tunable grating ribbon was successfully actuated with the time to peak of 26 μs. Changing of diffraction pattern of the device was also demonstrated.
AB - We developed a fabrication process of MEMS tunable grating supported by patterned polymer. The tunable grating was fabricated on single crystal silicon with thickness of 260 nm using membrane transfer bonding technique on glass. To obtain a good defined anchor structure of grating, two kinds of polymers were used for the fabrication of bonded wafer. The characteristic of the tunable grating ribbon was measured. The tunable grating ribbon was successfully actuated with the time to peak of 26 μs. Changing of diffraction pattern of the device was also demonstrated.
KW - Grating
KW - Micro-electro-mechanical systems (MEMS)
KW - Mono-crystalline silicon
KW - Polymer membrane transfer bonding
KW - Wavelength selective switch (WSS)
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U2 - 10.1541/ieejsmas.135.361
DO - 10.1541/ieejsmas.135.361
M3 - Article
AN - SCOPUS:84940656453
VL - 135
SP - 361
EP - 366
JO - IEEJ Transactions on Sensors and Micromachines
JF - IEEJ Transactions on Sensors and Micromachines
SN - 1341-8939
IS - 9
ER -