Fabrication and characterization of hydrogen absorption LaNi5 alloy films sputtered on nickel substrate

M. Ohtsuka, Y. Takeda, T. Kobayashi, K. Itagaki

Research output: Contribution to journalArticlepeer-review


LaNi5 films were deposited on a nickel substrate using a La2Ni7 alloy target with a sputtering power, Ws, of 50-400 W at substrate temperature, Ts, of 323-573 K by a radio frequency magnetron sputtering apparatus. The nickel content of the films decreased with increasing Ws and increased with increasing Ts. At low Ws and low Ts, amorphous films were deposited. In other conditions, the films were polycrystalline. The films deposited at high Ws and low Ts exhibited only a (hk · 0) peak in the X-ray diffraction profiles. This indicates that the c-axis of crystalline films was oriented parallel to the substrate plane. At high Ws and high Ts, the films with columnar structure were obtained. The hydrogen absorption capacity of the films increased with increasing Ws. On the other hand, the equilibrium pressure of the films decreased with increasing Ws. The films deposited at 400 W represented a pressure plateau on the pressure-composition isotherms.

Original languageEnglish
Pages (from-to)1134-1138
Number of pages5
JournalZeitschrift fuer Metallkunde/Materials Research and Advanced Techniques
Issue number10
Publication statusPublished - 2001 Oct 1


  • Crystal structure
  • Hydrogen absorption property
  • La-Ni alloy
  • Sputter deposition
  • Thin film

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Physical and Theoretical Chemistry
  • Metals and Alloys
  • Materials Chemistry


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