Fabrication and characterization of an integrated Schottky emitter array for multi-beam lithography applications

Ching Hsiang Tsai, Takahito Ono, Masayoshi Esashi

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The design, fabrication and characterization of an integrated Schottky emitter array are presented and demonstrated. The integrated emitter array consists of boron-doped diamond heaters with a diamond tip, Si micro gate array and Si focusing lens array. The diamond film is selectively deposited using electrophoresis of diamond seed particles and a hot filament chemical vapor deposition (HF-CVD) technique. The emitters, gate and lens array are electrically isolated from each other on a Pyrex glass substrate. When heating the diamond emitter at a voltage of 2.8 V, an emission current of 490 nA has been observed at an electric field of 0.36 V/μ,m. The emission current was found to be stable with a fluctuation of 2 % per hr. By fitting the measure data with Schottky emission model, the temperature at the emitter was calculated to be 1680°C.

Original languageEnglish
Title of host publicationProceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007
Pages373-376
Number of pages4
Publication statusPublished - 2007 Dec 1
Event20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007 - Kobe, Japan
Duration: 2007 Jan 21 → 2007 Jan 25

Publication series

NameProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN (Print)1084-6999

Other

Other20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007
CountryJapan
CityKobe
Period07/1/21 → 07/1/25

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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    Tsai, C. H., Ono, T., & Esashi, M. (2007). Fabrication and characterization of an integrated Schottky emitter array for multi-beam lithography applications. In Proceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007 (pp. 373-376). [4433145] (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)).