Fabrication and Basic Characteristics of Dry-Etched Micro Inductors

M. Yamaguchi, M. Matsumoto, H. Ohzeki, K. I. Arai

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)

Abstract

Thin film meander inductors having 10-6m range coil spacing were fabricated successfully. The inductance measured with microstrip line increased with increasing the coil spacing due to the dielectric coupling between the meander lines. Maximum value of the applicable current density is examined and it is clarified that the magnetic thin films are requested to provide high saturation magnetization in order to remain in the under saturated region in case of high current density applications. These results give a basis for developing thin film micro inductors and transformers.

Original languageEnglish
Pages (from-to)2014-2016
Number of pages3
JournalIEEE Transactions on Magnetics
Volume26
Issue number5
DOIs
Publication statusPublished - 1990 Sep

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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