Extreme nano-structure control by sputtering for the high density perpendicular recording media and head

Migaku Takahashi, Masakiyo Tsunoda, Shin Saito

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

In order to open a way to realize ultra high density hard disk (HD) drives with fast operation speed utilizing a spin nano-technology, precisely controlled fabrication technology with nano-scale for head and media according to the required properties is essential from material, processes, and physical view point. In the present paper, correlation between process parameter of ultra clean (UC) dry-process proposed by us and structure and physical property for ferro/antiferro interface, magnetic tunnel junctions and perpendicular magnetic recording media will be widely discussed.

Original languageEnglish
Title of host publicationECS Transactions - Magnetic Materials, Processes and Devices 10 - 214th ECS Meeting
Pages19-35
Number of pages17
Edition45
DOIs
Publication statusPublished - 2009 Nov 23
EventMagnetic Materials, Processes and Devices 10 - 214th ECS Meeting - Honolulu, HI, United States
Duration: 2008 Oct 122008 Oct 17

Publication series

NameECS Transactions
Number45
Volume16
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

OtherMagnetic Materials, Processes and Devices 10 - 214th ECS Meeting
CountryUnited States
CityHonolulu, HI
Period08/10/1208/10/17

ASJC Scopus subject areas

  • Engineering(all)

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    Takahashi, M., Tsunoda, M., & Saito, S. (2009). Extreme nano-structure control by sputtering for the high density perpendicular recording media and head. In ECS Transactions - Magnetic Materials, Processes and Devices 10 - 214th ECS Meeting (45 ed., pp. 19-35). (ECS Transactions; Vol. 16, No. 45). https://doi.org/10.1149/1.3140007