Experimental measurement of the intensity profiles of a low-energy electron beam extracted from a scanning tunneling microscope tip by field emission

Ippei Kawamoto, Lai Nan, Tatsuo Yoshinobu, Hiroshi Iwasaki

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

The intensity profile of a low-energy electron beam (e-beam) extracted from the tip apex of a scanning tunneling microscope (STM) in the field emission mode was measured in an ultrahigh-vacuum environment. The sizes of areas where the native Si oxide was removed by exposure to the low-energy e-beam were measured as a function of the e-beam exposure time, and it was found that the e-beam has a Gaussian-type lateral profile. The results show that the e-beam profile can be controlled by adjusting the parameters of the e-beam emission and that the sizes of the Si oxide opening windows can be adjusted by varying the e-beam exposure time.

Original languageEnglish
Pages (from-to)6172-6173
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume38
Issue number10
DOIs
Publication statusPublished - 1999 Oct

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Experimental measurement of the intensity profiles of a low-energy electron beam extracted from a scanning tunneling microscope tip by field emission'. Together they form a unique fingerprint.

  • Cite this