Examination of surface-roughness of silicon crystals by double-crystal x-ray topography

Michio Niwano, Tadashi Kobayashi, Nobuo Miyamoto

Research output: Contribution to journalArticle

Abstract

A new method of examining surface-roughness of silicon crystals, which uses the refraction effect in double-crystal X-ray topography, is proposed. It was shown that local slopes with an angle of inclination to a few tenths of a degree are detectable with this method.

Original languageEnglish
Pages (from-to)1113-1114
Number of pages2
JournalJapanese journal of applied physics
Volume27
Issue number6R
DOIs
Publication statusPublished - 1988 Jun

Keywords

  • Double-crystal method
  • Refraction effect
  • Silicon crystal
  • Surface-roughness
  • X-ray topography

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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