Evaluation of SF6 reactive ion etching performance with a permanent magnet located behind the substrate based on a simple design concept

Taisei Motomura, Kazunori Takahashi, Yuji Kasashima, Kazuya Kikunaga, Fumihiko Uesugi, Akira Ando

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Evaluation of SF6 reactive ion etching performance with a permanent magnet located behind the substrate based on a simple design concept'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds