Abstract
A method was examined for evaluating the electrical conductivity of a photoresist to predict its development speed. The conductivity of organic solutions of the photoresist base polymer at various frequencies was found to have a positive correlation with the dissolution speed of the photoresist base polymer into an alkaline developer. In addition, the influence of the measurement temperature and of the concentration of the polymer solution on the conductivity was investigated. It is shown that a prediction of development speed of a photoresist by measuring its conductivity is possible.
| Original language | English |
|---|---|
| Pages (from-to) | 3055-3058 |
| Number of pages | 4 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 16 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1998 |
| Externally published | Yes |
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering