TY - JOUR
T1 - Evaluation of a spherical aberration constant of the objective lens of HVEM at Tohoku University
AU - Park, Gyeong Su
AU - Shindo, Daisuke
PY - 1996
Y1 - 1996
N2 - A spherical aberration constant of the objective lens of a high-voltage electron microscope at Tohoku University (JEM-ARM1250) was evaluated by processing high-resolution electron microscope (HREM) images of an amorphous Ge thin film. The processing was carried out through a computer network system coupled with a highly efficient film scanner. From the intensity profiles of digital diffractograms of two HREM images, the spherical aberration constant of the objective lens (Cs) is estimated to be Cs = 1.74±0.10 mm and their defocus values are estimated to be about +77 nm and +118 nm, respectively.
AB - A spherical aberration constant of the objective lens of a high-voltage electron microscope at Tohoku University (JEM-ARM1250) was evaluated by processing high-resolution electron microscope (HREM) images of an amorphous Ge thin film. The processing was carried out through a computer network system coupled with a highly efficient film scanner. From the intensity profiles of digital diffractograms of two HREM images, the spherical aberration constant of the objective lens (Cs) is estimated to be Cs = 1.74±0.10 mm and their defocus values are estimated to be about +77 nm and +118 nm, respectively.
KW - Digital diffractogram
KW - Film scanner
KW - High-resolution image
KW - High-voltage electron microscope
KW - Intensity profile
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U2 - 10.1093/oxfordjournals.jmicro.a023425
DO - 10.1093/oxfordjournals.jmicro.a023425
M3 - Review article
AN - SCOPUS:0343124949
VL - 45
SP - 152
EP - 158
JO - Microscopy (Oxford, England)
JF - Microscopy (Oxford, England)
SN - 2050-5698
IS - 2
ER -