Etch rate dependence on crystal orientation for lithium niobate

Andrew B. Randles; Shuji Tanaka; Masayoshi Esashi

doi:10.1109/ULTSYM.2007.533

Etch rate dependence on crystal orientation for lithium niobate

Andrew B. Randles, Shuji Tanaka, Masayoshi Esashi

ENG - Robotics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Citations (Scopus)

Abstract

This paper presents experimental data for the etch rate of lithium niobate (LiNbO₃) as a function of crystal orientation. The etching characterization is a fundamental technology needed for the fabrication of new sensors, actuators or other new devices. In this study, 30 mm spheres of LiNbO₃ were etched in hydrofluoric acid and in a solution of hydrofluoric and nitric acids, to determine the etch rate dependence on crystal orientation. It was found that the maximum etch rate was on the -Z face and the etching showed a three-fold symmetry about the Z axis. The Wulff-Jaccodine method as well as the data collected from the etched spheres were used to predict the etched shape of a wafer. The predicted shape agreed with that found during etching.

Original language	English
Title of host publication	2007 IEEE Ultrasonics Symposium Proceedings, IUS
Pages	2119-2122
Number of pages	4
DOIs	https://doi.org/10.1109/ULTSYM.2007.533
Publication status	Published - 2007 Dec 1
Event	2007 IEEE Ultrasonics Symposium, IUS - New York, NY, United States Duration: 2007 Oct 28 → 2007 Oct 31

Publication series

Name	Proceedings - IEEE Ultrasonics Symposium
ISSN (Print)	1051-0117

Other

Other	2007 IEEE Ultrasonics Symposium, IUS
Country/Territory	United States
City	New York, NY
Period	07/10/28 → 07/10/31

ASJC Scopus subject areas

Acoustics and Ultrasonics

Access to Document

10.1109/ULTSYM.2007.533

Cite this

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title = "Etch rate dependence on crystal orientation for lithium niobate",

abstract = "This paper presents experimental data for the etch rate of lithium niobate (LiNbO3) as a function of crystal orientation. The etching characterization is a fundamental technology needed for the fabrication of new sensors, actuators or other new devices. In this study, 30 mm spheres of LiNbO3 were etched in hydrofluoric acid and in a solution of hydrofluoric and nitric acids, to determine the etch rate dependence on crystal orientation. It was found that the maximum etch rate was on the -Z face and the etching showed a three-fold symmetry about the Z axis. The Wulff-Jaccodine method as well as the data collected from the etched spheres were used to predict the etched shape of a wafer. The predicted shape agreed with that found during etching.",

author = "Randles, {Andrew B.} and Shuji Tanaka and Masayoshi Esashi",

year = "2007",

month = dec,

day = "1",

doi = "10.1109/ULTSYM.2007.533",

language = "English",

isbn = "1424413834",

series = "Proceedings - IEEE Ultrasonics Symposium",

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booktitle = "2007 IEEE Ultrasonics Symposium Proceedings, IUS",

note = "2007 IEEE Ultrasonics Symposium, IUS ; Conference date: 28-10-2007 Through 31-10-2007",

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TY - GEN

T1 - Etch rate dependence on crystal orientation for lithium niobate

AU - Randles, Andrew B.

AU - Tanaka, Shuji

AU - Esashi, Masayoshi

PY - 2007/12/1

Y1 - 2007/12/1

N2 - This paper presents experimental data for the etch rate of lithium niobate (LiNbO3) as a function of crystal orientation. The etching characterization is a fundamental technology needed for the fabrication of new sensors, actuators or other new devices. In this study, 30 mm spheres of LiNbO3 were etched in hydrofluoric acid and in a solution of hydrofluoric and nitric acids, to determine the etch rate dependence on crystal orientation. It was found that the maximum etch rate was on the -Z face and the etching showed a three-fold symmetry about the Z axis. The Wulff-Jaccodine method as well as the data collected from the etched spheres were used to predict the etched shape of a wafer. The predicted shape agreed with that found during etching.

AB - This paper presents experimental data for the etch rate of lithium niobate (LiNbO3) as a function of crystal orientation. The etching characterization is a fundamental technology needed for the fabrication of new sensors, actuators or other new devices. In this study, 30 mm spheres of LiNbO3 were etched in hydrofluoric acid and in a solution of hydrofluoric and nitric acids, to determine the etch rate dependence on crystal orientation. It was found that the maximum etch rate was on the -Z face and the etching showed a three-fold symmetry about the Z axis. The Wulff-Jaccodine method as well as the data collected from the etched spheres were used to predict the etched shape of a wafer. The predicted shape agreed with that found during etching.

UR - http://www.scopus.com/inward/record.url?scp=48149092752&partnerID=8YFLogxK

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U2 - 10.1109/ULTSYM.2007.533

DO - 10.1109/ULTSYM.2007.533

M3 - Conference contribution

AN - SCOPUS:48149092752

SN - 1424413834

SN - 9781424413836

T3 - Proceedings - IEEE Ultrasonics Symposium

SP - 2119

EP - 2122

BT - 2007 IEEE Ultrasonics Symposium Proceedings, IUS

T2 - 2007 IEEE Ultrasonics Symposium, IUS

Y2 - 28 October 2007 through 31 October 2007

ER -

Etch rate dependence on crystal orientation for lithium niobate

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