Erratum: Angle-resolved phototelectron study on the structures of silicon nitride films and Si3N4/Si interfaces formed using nitrogen-hydrogen radicals (Journal of Applied Physics (2008) 104 (114112))

Takashi Aratani, Masaaki Higuchi, Shigetoshi Sugawa, Eiji Ikenaga, Jiro Ushio, Hiroshi Nohira, Tomoyuki Suwa, Akinobu Teramoto, Tadahiro Ohimi, Takeo Hattori

Research output: Contribution to journalComment/debate

1 Citation (Scopus)
Original languageEnglish
Article number069902
JournalJournal of Applied Physics
Volume107
Issue number6
DOIs
Publication statusPublished - 2010 Apr 14

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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