EPR Study on Cr2+Distribution in LEC GaAs:Cr Wafers

Maki Suemitsu, Yoshihiro Suzuki, Nobuo Miyamoto

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

EPR measurements were made on two LEC-grown (100) GaAs:Cr wafers. For both samples, [Cr]=2 wt-ppm. The observed Cr2+distributions showed inverted-U type (wafer A) and W-type (wafer B) variations. However, the leakage current (IL) distributions for the respective wafers showed U-type and M-type variations, indicating an inverse correspondence between the IL, and Cr2+distributions. Although a consideration of the compensation mechanism suggests that the Cr2+depletion at the periphery in wafer A is determined by the Cr distribution itself, atomic absorption measurements on the same wafer showed no such depletion of Cr. This result can be explained in terms of the nonuniform distribution of electrically-inactive Cr atoms in the wafer.

Original languageEnglish
Number of pages1
JournalJapanese journal of applied physics
Volume23
Issue number6R
DOIs
Publication statusPublished - 1984 Jun

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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