Epitaxial L10-FeNi films with high degree of order and large uniaxial magnetic anisotropy fabricated by denitriding FeNiN films

Keita Ito, Masahiro Hayashida, Hiroto Masuda, Takahiro Nishio, Sho Goto, Hiroaki Kura, Tomoyuki Koganezawa, Masaki Mizuguchi, Yusuke Shimada, Toyohiko J. Konno, Hideto Yanagihara, Koki Takanashi

Research output: Contribution to journalArticlepeer-review

Abstract

L10-orderd FeNi alloy films with a high degree of order (S) and a large uniaxial magnetic anisotropy energy (Ku) were realized by denitriding FeNiN films. FeNiN films with the a-axis perpendicular to the film plane were epitaxially grown on SrTiO3 (001) substrates by molecular beam epitaxy by changing the growth temperatures (TS) to 200, 250, and 350 °C. The a-axis oriented epitaxial L10-FeNi films were fabricated by annealing the FeNiN films in a H2 gas atmosphere at 300 °C. S and Ku of the denitrided L10-FeNi films were characterized by anomalous X-ray diffraction using synchrotron radiation and magnetic torque measurements, respectively. A high S of 0.87 and a Ku of 5.9 × 105 J/m3 were realized in the L10-FeNi film with a TS of 350 °C. This high S value exceeds the values reported on L10-FeNi to date, but the Ku value was comparable to those of c-axis oriented L10-FeNi films with S ∼0.5 grown by alternate monoatomic deposition of Fe and Ni layers. A possible origin for the suppressed macroscopic Ku in a-axis oriented L10-FeNi films is discussed, and denitriding FeNiN is a promising method for the fabrication of L10-FeNi with a high S and a large Ku.

Original languageEnglish
Article number242404
JournalApplied Physics Letters
Volume116
Issue number24
DOIs
Publication statusPublished - 2020 Jun 15

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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