Epitaxial growth of Li4Ti5O12 thin films using RF magnetron sputtering

Akichika Kumatani, Susumu Shiraki, Yoshitaka Takagi, Tohru Suzuki, Takeo Ohsawa, Xiang Gao, Yuichi Ikuhara, Taro Hitosugi

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

We fabricated Li4Ti5O12(111) epitaxial thin films on α-Al2O3(0001) substrates by RF magnetron sputtering. Thin films of amorphous Li4Ti5O 12 were deposited at room temperature, and then the films were annealed at high temperatures for the formation of epitaxial thin films. Furthermore, we investigated the effect of niobium (Nb) incorporation into Li4Ti5O12. The Nb-incorporated Li 4Ti5O12 thin films showed an improvement in crystallinity with a narrower rocking curve full width at half-maximum of 0.36o for the Li4Ti5O12(111) peak. Further, the resistivity of the Nb-incorporated film dropped three orders of magnitude on the Nb incorporation.

Original languageEnglish
Article number058001
JournalJapanese journal of applied physics
Volume53
Issue number5
DOIs
Publication statusPublished - 2014 May

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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