Epitaxial Growth of β-Bi2O3 Thin Films and Particles with Mist Chemical Vapor Deposition

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

Metastable β-Bi2O3 (201) epitaxial thin films and particles were synthesized on α-Al2O3 (0001) single crystal substrates with mist chemical vapor deposition. With increasing synthesis temperature, the morphology of β-Bi2O3 was transformed from flat thin film with root-mean-square roughness of about 1 nm to nano-or micro-particles, in which the thin films and particles showed good crystallinity despite the large lattice mismatch between β-Bi2O3 and α-Al2O3. The key factor to stabilize the metastable β-phase was crystallization from the amorphous phase by solid phase epitaxy. Short postannealing significantly improved the crystallinity and surface flatness.

Original languageEnglish
Pages (from-to)7170-7174
Number of pages5
JournalCrystal Growth and Design
Volume19
Issue number12
DOIs
Publication statusPublished - 2019 Dec 4

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

Fingerprint Dive into the research topics of 'Epitaxial Growth of β-Bi<sub>2</sub>O<sub>3</sub> Thin Films and Particles with Mist Chemical Vapor Deposition'. Together they form a unique fingerprint.

Cite this