TY - JOUR
T1 - Epitaxial Growth of β-Bi2O3 Thin Films and Particles with Mist Chemical Vapor Deposition
AU - Sun, Zaichun
AU - Oka, Daichi
AU - Fukumura, Tomoteru
N1 - Publisher Copyright:
Copyright © 2019 American Chemical Society.
PY - 2019/12/4
Y1 - 2019/12/4
N2 - Metastable β-Bi2O3 (201) epitaxial thin films and particles were synthesized on α-Al2O3 (0001) single crystal substrates with mist chemical vapor deposition. With increasing synthesis temperature, the morphology of β-Bi2O3 was transformed from flat thin film with root-mean-square roughness of about 1 nm to nano-or micro-particles, in which the thin films and particles showed good crystallinity despite the large lattice mismatch between β-Bi2O3 and α-Al2O3. The key factor to stabilize the metastable β-phase was crystallization from the amorphous phase by solid phase epitaxy. Short postannealing significantly improved the crystallinity and surface flatness.
AB - Metastable β-Bi2O3 (201) epitaxial thin films and particles were synthesized on α-Al2O3 (0001) single crystal substrates with mist chemical vapor deposition. With increasing synthesis temperature, the morphology of β-Bi2O3 was transformed from flat thin film with root-mean-square roughness of about 1 nm to nano-or micro-particles, in which the thin films and particles showed good crystallinity despite the large lattice mismatch between β-Bi2O3 and α-Al2O3. The key factor to stabilize the metastable β-phase was crystallization from the amorphous phase by solid phase epitaxy. Short postannealing significantly improved the crystallinity and surface flatness.
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U2 - 10.1021/acs.cgd.9b01033
DO - 10.1021/acs.cgd.9b01033
M3 - Article
AN - SCOPUS:85075000335
SN - 1528-7483
VL - 19
SP - 7170
EP - 7174
JO - Crystal Growth and Design
JF - Crystal Growth and Design
IS - 12
ER -