Enhancing the focused ion beam etch rate of Ag films by Joule heating

Takahiro Sasaki, Hironori Tohmyoh

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


In this paper, the authors report on using Joule heating to increase the etch rate of focused ion beam (FIB) for etching Ag films. FIB is widely used as a tool for processing micro/nanomaterials. In this process, material atoms are expelled when the ion beam is irradiated on the material surface. On the other hand, Joule heating has been used for the structural modification of small-scale materials. Because in the FIB etching, the atoms are expected to be easily expelled by decreasing the density of grain boundaries of a metal, the FIB etch rate of the metal might be enhanced by structural modification with Joule heating. In this research, an Ag film was subjected to current-stressing, and FIB etching was carried out. It was confirmed that grains in the film grew due to Joule heating and that the FIB etch rate for Ag increased. The authors showed that the FIB etch rate for Ag could be enhanced by Joule heating. The results of this study will help in developing metal etch processes for micro/nanomaterials.

Original languageEnglish
Article number061210
JournalJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
Issue number6
Publication statusPublished - 2018 Nov 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry


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