TY - JOUR
T1 - Enhancing the focused ion beam etch rate of Ag films by Joule heating
AU - Sasaki, Takahiro
AU - Tohmyoh, Hironori
N1 - Funding Information:
The authors would like to acknowledge M. Saka for his valuable discussions throughout this work and T. Miyazaki for his kind support on the EBSD analysis. Part of this work was performed at the Micro/Nano-Machining Research and Education Center of Tohoku University. This work was supported by JSPS KAKENHI under Grant No. 18H01331.
Publisher Copyright:
© 2018 Author(s).
PY - 2018/11/1
Y1 - 2018/11/1
N2 - In this paper, the authors report on using Joule heating to increase the etch rate of focused ion beam (FIB) for etching Ag films. FIB is widely used as a tool for processing micro/nanomaterials. In this process, material atoms are expelled when the ion beam is irradiated on the material surface. On the other hand, Joule heating has been used for the structural modification of small-scale materials. Because in the FIB etching, the atoms are expected to be easily expelled by decreasing the density of grain boundaries of a metal, the FIB etch rate of the metal might be enhanced by structural modification with Joule heating. In this research, an Ag film was subjected to current-stressing, and FIB etching was carried out. It was confirmed that grains in the film grew due to Joule heating and that the FIB etch rate for Ag increased. The authors showed that the FIB etch rate for Ag could be enhanced by Joule heating. The results of this study will help in developing metal etch processes for micro/nanomaterials.
AB - In this paper, the authors report on using Joule heating to increase the etch rate of focused ion beam (FIB) for etching Ag films. FIB is widely used as a tool for processing micro/nanomaterials. In this process, material atoms are expelled when the ion beam is irradiated on the material surface. On the other hand, Joule heating has been used for the structural modification of small-scale materials. Because in the FIB etching, the atoms are expected to be easily expelled by decreasing the density of grain boundaries of a metal, the FIB etch rate of the metal might be enhanced by structural modification with Joule heating. In this research, an Ag film was subjected to current-stressing, and FIB etching was carried out. It was confirmed that grains in the film grew due to Joule heating and that the FIB etch rate for Ag increased. The authors showed that the FIB etch rate for Ag could be enhanced by Joule heating. The results of this study will help in developing metal etch processes for micro/nanomaterials.
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U2 - 10.1116/1.5054991
DO - 10.1116/1.5054991
M3 - Article
AN - SCOPUS:85057048386
VL - 36
JO - Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
JF - Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
SN - 2166-2746
IS - 6
M1 - 061210
ER -