Enhancement factor in the emission intensities excited by radiofrequency-powered glow discharge plasma associated with bias-current introduction

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12 Citations (Scopus)

Abstract

The introduction of a d.c. bias current to an r.f. glow discharge plasma led to enhancement in the intensities of particular emission lines. Atomic emission lines having the excitation energy of 3-4 eV were commonly enhanced 10-20 times by conducting the bias current of 20-30 mA. The enhancement factor strongly depended upon both the pressure of the plasma gas and the r.f. applied power. The intensities of atomic emission lines having the excitation energy of c.a. 5.7 eV were much more elevated and their enhancement factors exceeded 50. However, little increases for emission lines having the excitation energy more than 7 eV were observed regardless of the plasma conditions.

Original languageEnglish
Pages (from-to)1488-1493
Number of pages6
JournalIsij International
Volume41
Issue number12
DOIs
Publication statusPublished - 2001

Keywords

  • Copper
  • D.c. bias current
  • Enhancement factor
  • Excitation energy
  • Glow discharge optical emission spectrometry
  • R.f. plasma

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

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