Enhanced saturation of sputtered amorphous SiN film frameworks using He- and Ne-Penning effects

Iwao Sugimoto, Satoko Nakano, Hiroki Kuwano

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

Abstract

Optical emission spectroscopy reveals that helium and neon gases enhance the nitridation reactivity of the nitrogen plasma by Penning effects during magnetron sputtering of the silicon target. These excited nitrogen plasmas promote the saturation of frameworks of the resultant silicon nitride films. X-ray photoelectron spectroscopy, electron spin resonance, and x-ray diffraction analyses provide insight into the structure of these films, and thermal desorption mass spectroscopy reveals the behavior of volatile species in these films.

Original languageEnglish
Pages (from-to)7710-7717
Number of pages8
JournalJournal of Applied Physics
Volume75
Issue number12
DOIs
Publication statusPublished - 1994
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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