Enhanced nano-oxidation on a SC1-treated Si surface using atomic force microscopy

Won Chu Moon, Tatsuo Yoshinobu, Hiroshi Iwasaki

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We studied the effects of hydrophilicity of Si surfaces on nanometer-scale anodic oxidation with atomic force microscopy (AFM). We found that nano-oxidation is greatly enhanced on a SC1-treated Si (111) surface, which is hydrophilic, compared with that on a hydrophobic HF-treated surface: The average height (average width) of the oxide line was 4.8 nm (550 nm) for the former surface and 1.9 nm (340 nm) for the latter one, for a bias voltage of 18 V and a scan rate of 2.3 μm/s. The enhanced nano-oxidation was reverted when the SC1-treated Si surface was modified with chlorotrimethylsilane.

Original languageEnglish
Pages (from-to)4754-4757
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume41
Issue number7 A
Publication statusPublished - 2002 Jul 1
Externally publishedYes

Keywords

  • AFM
  • Anodic oxidation
  • Hydrophilicity
  • Nanofabrication
  • Silicon

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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