Enhanced durability of antisticking layers by recoating a silica surface with fluorinated alkylsilane derivatives by chemical vapor surface modification

Akihiro Kohno, Nobuji Sakai, Shinji Matsui, Masaru Nakagawa

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    15 Citations (Scopus)

    Abstract

    Adsorbed monolayers from (3,3,3-trifluoropropyl)trimethoxysilane (FAS3), (tridecafluoro-1,1,2,2-tetrahydrooctyl)trimethoxysilane (FAS13), (heptadecafluoro-1,1,2,2-tetrahydrodecyl)trimethoxysilane (FAS17), and (heptadecafluoro-1,1,2,2-tetrahydrodecyl)trichlorosilane (FAS17-Cl) were formed by chemical vapor surface modification (CVSM) on silica lens surfaces cleaned by exposure to vacuum ultraviolet (VUV) light at 172 nm. Changes in monolayer-modified lens surfaces concomitant with repeating a cycle of curing to induce the radical polymerization of a UVcurable resin and detaching the UV-cured resin were monitored by contact angle measurement with water and atomic force microscopy to investigate the property of the adsorbed monolayers as antisticking layers in UV nanoimprint lithography. A decrease of the contact angle for water with increasing the number of repeated cycles was mainly responsible for the removal of surface impurities in the form of nanoparticles on detaching the cured resin repeatedly. It was found that recoating the silica lens surface with monolayers from FAS13, FAS17, and FAS17-Cl after cleaning by VUV-light exposure resulted in the suppression of the decrease in the contact angle. These results indicate that the durability of an antisticking layer in UV nanoimprint lithography is markedly improved by the recoating.

    Original languageEnglish
    Pages (from-to)06GL121-06GL126
    JournalJapanese journal of applied physics
    Volume49
    Issue number6 PART 2
    DOIs
    Publication statusPublished - 2010 Jun 1

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

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