Enhanced collimation in narrow channels fabricated by focused-ion-beam implantation

T. Bever, Y. Hirayama, S. Tarucha

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

We investigate the collimation factor of narrow channels defined by focused-ion-beam insulation writing in the highly mobile two-dimensional electron gas of an AlGaAs/GaAs heterostructure. We show that the degree of collimation can be enhanced by appropriate channel design. Additional boundary roughness caused by selective implantation of ions along the channel boundary considerably increases the collimation.

Original languageEnglish
Pages (from-to)2477-2480
Number of pages4
JournalJournal of Applied Physics
Volume75
Issue number5
DOIs
Publication statusPublished - 1994
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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