Enhanced collimation in narrow channels fabricated by focused-ion-beam implantation

T. Bever; Y. Hirayama; S. Tarucha

doi:10.1063/1.356245

Enhanced collimation in narrow channels fabricated by focused-ion-beam implantation

T. Bever, Y. Hirayama, S. Tarucha

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

We investigate the collimation factor of narrow channels defined by focused-ion-beam insulation writing in the highly mobile two-dimensional electron gas of an AlGaAs/GaAs heterostructure. We show that the degree of collimation can be enhanced by appropriate channel design. Additional boundary roughness caused by selective implantation of ions along the channel boundary considerably increases the collimation.

Original language	English
Pages (from-to)	2477-2480
Number of pages	4
Journal	Journal of Applied Physics
Volume	75
Issue number	5
DOIs	https://doi.org/10.1063/1.356245
Publication status	Published - 1994
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy(all)

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abstract = "We investigate the collimation factor of narrow channels defined by focused-ion-beam insulation writing in the highly mobile two-dimensional electron gas of an AlGaAs/GaAs heterostructure. We show that the degree of collimation can be enhanced by appropriate channel design. Additional boundary roughness caused by selective implantation of ions along the channel boundary considerably increases the collimation.",

author = "T. Bever and Y. Hirayama and S. Tarucha",

year = "1994",

doi = "10.1063/1.356245",

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AU - Bever, T.

AU - Hirayama, Y.

AU - Tarucha, S.

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AB - We investigate the collimation factor of narrow channels defined by focused-ion-beam insulation writing in the highly mobile two-dimensional electron gas of an AlGaAs/GaAs heterostructure. We show that the degree of collimation can be enhanced by appropriate channel design. Additional boundary roughness caused by selective implantation of ions along the channel boundary considerably increases the collimation.

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M3 - Article

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SN - 0021-8979

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Enhanced collimation in narrow channels fabricated by focused-ion-beam implantation

Abstract

ASJC Scopus subject areas

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