Elucidation of the reaction mechanism during the removal of copper oxide by halogen surfactant at the surface of copper plate

Shun Yokoyama, Hideyuki Takahashi, Takashi Itoh, Kenichi Motomiya, Kazuyuki Tohji

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Elucidation of the reaction mechanism during the removal of copper oxide by halogen surfactant at the surface of copper plate'. Together they form a unique fingerprint.

Physics & Astronomy

Engineering & Materials Science

Chemical Compounds