Ellipsometric analysis of relationship between formation condition and corrosion resistance of CVD-ZrO2 thin films

Takeo Kubota, Noboru Akao, Nobuyoshi Hara, Katsuhisa Sugimoto

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5 Citations (Scopus)


ZrO2 thin films were formed by chemical vapor deposition using Zr (O-i-C3H7)4 and O2 at the substrate temperatures of 523-723 K. Changes in the thickness and refractive index of the films were measured by ellipsometry during deposition. The corrosion resistance of the films was tested in 1 kmol·m-3 HF. The decrease in film thickness of the test solution was determined by ellipsometry. The chemical composition of the films was analyzed by AES, XPS, and FTIR. The microstructure of the films was observed by TEM. It was found that the deposition rate and the corrosion resistance of the films became maximum when deposition was performed at 673 K and 623 K, respectively. There was a close relationship between the corrosion resistance and the refractive index of the films, that is, the highest corrosion resistance was attained on a film with the highest refractive index. The decreases in refractive index of films at the substrate temperatures lower and higher than 623 K were attributed to increases in the amount of OH bonds in the films and in the surface roughness of the films, respectively.

Original languageEnglish
Pages (from-to)980-987
Number of pages8
JournalNippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Issue number10
Publication statusPublished - 1996


  • Chemical vapor deposition
  • Corrosion resistance
  • Ellipsometry
  • Growth rate
  • In-situ analysis
  • Refractive index
  • Zirconia films

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanics of Materials
  • Metals and Alloys
  • Materials Chemistry


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