Ellipsometric Analysis of Growth Process and Corrosion Resistance of Nb2O5 Films Formed by MOCVD

Nobuyoshi Hara, Eiichi Takahashi, Katsuhisa Sugimoto, Jae Hong Yoon

Research output: Contribution to journalArticlepeer-review

30 Citations (Scopus)

Abstract

The formation process of Nb2O5 films by metallorganic chemical vapor deposition using pentaethoxy niobium (PEN: Nb(OC2H5)5) as a vapor source and O2 as reactant gas has been analyzed by in situ ellipsometry at substrate temperatures of 200 to 500°C, and at O2 flow rates of 0 to 2000 cm3/min. According to the changes in the refractive index and the growth rate of the films, the formation process can be divided into three stages, that is, the nucleation and coalescence, the homogeneous growth, and the surface roughness evolution stages. The refractive index and the growth rate of the films were found to depend on the substrate temperature and the O2 flow rate. The films deposited at 200 to 400°C had amorphous structures, and those deposited at 450 to 500°C contained a δ-Nb2O5 phase in an amorphous matrix. The corrosion resistance of the films in a buffered HF solution depended on both the deposition temperature and the O2 flow rate. The film deposited at 450°C in the absence of O2 showed the highest corrosion resistance against the solution.

Original languageEnglish
Pages (from-to)1669-1674
Number of pages6
JournalJournal of the Electrochemical Society
Volume141
Issue number6
DOIs
Publication statusPublished - 1994 Jun

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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