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Elementary gas-phase reactions of radical species during chemical vapor deposition of silicon carbide using CH3SiCl3
Noboru Sato, Yuichi Funato, Kohei Shima, Hidetoshi Sugiura, Yasuyuki Fukushima, Takeshi Momose, Mitsuo Koshi, Yukihiro Shimogaki
Research output: Contribution to journal › Article › peer-review
2
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(Scopus)