TY - JOUR
T1 - Elemental X-ray images obtained by grazing-exit electron probe microanalysis (GE-EPMA)
AU - Tsuji, Kouichi
AU - Nullens, Rik
AU - Wagatsuma, Kazuaki
AU - Van Grieken, René E.
PY - 1999/12/1
Y1 - 1999/12/1
N2 - A new method, grazing-exit electron probe microanalysis (GE-EPMA), was studied. Only X-rays emitted from the near-surface layer are measured at grazing-exit angles (e.g. <0.5°), whereas, with conventional EPMA, X-rays emitted from deep positions are also measured. Therefore, X-ray spectra with low background are obtained by GE-EPMA. Here, elemental mapping by GE-EPMA is shown for the first time. It was found that surface-sensitive elemental X-ray images were obtained for a thin Au film deposited on a Si wafer. The problems that occur at boundaries of different heights are discussed. Furthermore, it was difficult to recognize elemental distributions of Si, S, Ca, Na and Fe for aerosols deposited on a Si wafer in noisy X-ray images when using conventional EPMA; however, clear X-ray images were obtained under grazing-exit conditions.
AB - A new method, grazing-exit electron probe microanalysis (GE-EPMA), was studied. Only X-rays emitted from the near-surface layer are measured at grazing-exit angles (e.g. <0.5°), whereas, with conventional EPMA, X-rays emitted from deep positions are also measured. Therefore, X-ray spectra with low background are obtained by GE-EPMA. Here, elemental mapping by GE-EPMA is shown for the first time. It was found that surface-sensitive elemental X-ray images were obtained for a thin Au film deposited on a Si wafer. The problems that occur at boundaries of different heights are discussed. Furthermore, it was difficult to recognize elemental distributions of Si, S, Ca, Na and Fe for aerosols deposited on a Si wafer in noisy X-ray images when using conventional EPMA; however, clear X-ray images were obtained under grazing-exit conditions.
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U2 - 10.1039/a905301h
DO - 10.1039/a905301h
M3 - Article
AN - SCOPUS:0033329424
VL - 14
SP - 1711
EP - 1713
JO - Journal of Analytical Atomic Spectrometry
JF - Journal of Analytical Atomic Spectrometry
SN - 0267-9477
IS - 11
ER -