Electrostatically levitated spherical 3-axis accelerometer

Risaku Toda; Nobuo Takeda; Takao Murakoshi; Shigeru Nakamura; Masayoshi Esashi

doi:10.1109/MEMSYS.2002.984369

Electrostatically levitated spherical 3-axis accelerometer

Risaku Toda, Nobuo Takeda, Takao Murakoshi, Shigeru Nakamura, Masayoshi Esashi

Micro System Integration Center (μSIC)

Research output: Contribution to journal › Article › peer-review

62 Citations (Scopus)

Abstract

MEMS-based electrostatically levitated spherical 3-axis accelerometer has been developed. Fabrication of the spherical MEMS device is made possible by incorporating Ball Semiconductor technology and a novel sacrificial etching process utilizing xenon difluoride gas etching through gas permeable layer. 1-millimeter diameter spherical proof mass is completely suspended without any mechanical support by closed-loop controlled electrostatic forcers. 3-axis acceleration is derived from intensity of servo feedback between capacitive position sensing and the electrostatic actuation. Noise floor is estimated as 40μG/Hz^1/2 level. After calibrating geometrical misalignment, scale factor and zero-G offset errors, linear output with minimal cross-axis error is obtained.

Original language	English
Pages (from-to)	710-712
Number of pages	3
Journal	Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)
DOIs	https://doi.org/10.1109/MEMSYS.2002.984369
Publication status	Published - 2002

ASJC Scopus subject areas

Mechanical Engineering
Electrical and Electronic Engineering
Control and Systems Engineering

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abstract = "MEMS-based electrostatically levitated spherical 3-axis accelerometer has been developed. Fabrication of the spherical MEMS device is made possible by incorporating Ball Semiconductor technology and a novel sacrificial etching process utilizing xenon difluoride gas etching through gas permeable layer. 1-millimeter diameter spherical proof mass is completely suspended without any mechanical support by closed-loop controlled electrostatic forcers. 3-axis acceleration is derived from intensity of servo feedback between capacitive position sensing and the electrostatic actuation. Noise floor is estimated as 40μG/Hz1/2 level. After calibrating geometrical misalignment, scale factor and zero-G offset errors, linear output with minimal cross-axis error is obtained.",

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AU - Toda, Risaku

AU - Takeda, Nobuo

AU - Murakoshi, Takao

AU - Nakamura, Shigeru

AU - Esashi, Masayoshi

PY - 2002

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AB - MEMS-based electrostatically levitated spherical 3-axis accelerometer has been developed. Fabrication of the spherical MEMS device is made possible by incorporating Ball Semiconductor technology and a novel sacrificial etching process utilizing xenon difluoride gas etching through gas permeable layer. 1-millimeter diameter spherical proof mass is completely suspended without any mechanical support by closed-loop controlled electrostatic forcers. 3-axis acceleration is derived from intensity of servo feedback between capacitive position sensing and the electrostatic actuation. Noise floor is estimated as 40μG/Hz1/2 level. After calibrating geometrical misalignment, scale factor and zero-G offset errors, linear output with minimal cross-axis error is obtained.

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