Electron-cyclotron resonance Ar plasma-induced electrical activation of B atoms without substrate heating in B doped Si epitaxial films on Si(100)

Engineering & Materials Science

• Electron cyclotron resonance 100%
• Epitaxial films 84%
• Atoms 57%
• Plasmas 51%
• Chemical activation 49%
• Heating 39%
• Substrates 39%
• Irradiation 32%
• Deposition rates 10%
• Thick films 9%
• Partial pressure 9%
• Semiconductor devices 9%
• Microwaves 6%
• Fabrication 5%
• Decomposition 5%

Physics & Astronomy

• electron cyclotron resonance 60%
• activation 44%
• heating 34%
• atoms 28%
• irradiation 14%
• deactivation 6%
• semiconductor devices 5%
• partial pressure 5%
• thick films 5%

Chemical Compounds

• Electron Cyclotron Resonance 86%
• Epitaxial Film 79%
• Partial Pressure 8%
• Microwave 7%
• Surface 5%