Electron beam irradiation-induced reduction of Sn on epitaxial rutile SnxTi1-xO2 alloy thin films

Yutaro Komuro, Hiroshi Kumigashira, Masaharu Oshima, Yuji Matsumoto

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Epitaxially-grown SnxTi1 - xO2 alloy thin films with different compositions were fabricated by successive deposition of SnO2 on ultra-smooth Nb-doped TiO2 (rutile) (110) substrates. The surface Sn atoms of the SnxTi1 - xO 2, which took a tetravalent state just after the deposition under the present condition, were reduced into a metallic state by electron beam irradiation, but not for a pure SnO2 film. The reduction process approximately obeys zero-order kinetics; the reaction rate constant linearly increases with an increase of the surface composition of Ti. Based on these results, the reduction mechanism is discussed.

Original languageEnglish
Pages (from-to)2555-2558
Number of pages4
JournalThin Solid Films
Volume519
Issue number8
DOIs
Publication statusPublished - 2011 Feb 1
Externally publishedYes

Keywords

  • Alloys
  • Auger electron spectroscopy
  • Thin film
  • Tin oxides
  • Titanium oxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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