The second-order nonlinear optical (NLO) properties of silica glass films were induced by electron-beam (EB) irradiation. The impurities in the glass were found to include Al, Ca, Cu, Fe, Na, K, Li, Mg, Mn, Ti and OH. The second-harmonic (SH) intensity from films doped with Ge was examined as a function of EB current, EB acceleration voltage and the constant EB dose, while the NLO coefficient was derived as a function of the number of Ge chips sputtered on the glass target. The SH intensity distribution of the NLO gratings, produced through periodic EB irradiation, was analyzed at varying EB current and dose. Finally, the influence of film thickness on the SH intensity from the silica film was determined.
ASJC Scopus subject areas
- Physics and Astronomy(all)