Electron-beam irradiation-induced nonlinearity in silicate glass films and fabrication of nonlinear optical gratings

Makoto Nakanishi, Okihiro Sugihara, Naomichi Okamoto, Hisashi Fujimura, Chikara Egami

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The second-order nonlinear optical (NLO) properties of silica glass films were induced by electron-beam (EB) irradiation. The impurities in the glass were found to include Al, Ca, Cu, Fe, Na, K, Li, Mg, Mn, Ti and OH. The second-harmonic (SH) intensity from films doped with Ge was examined as a function of EB current, EB acceleration voltage and the constant EB dose, while the NLO coefficient was derived as a function of the number of Ge chips sputtered on the glass target. The SH intensity distribution of the NLO gratings, produced through periodic EB irradiation, was analyzed at varying EB current and dose. Finally, the influence of film thickness on the SH intensity from the silica film was determined.

Original languageEnglish
Pages (from-to)2393-2396
Number of pages4
JournalJournal of Applied Physics
Volume86
Issue number5
DOIs
Publication statusPublished - 1999 Sep

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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