Electron- and photon-stimulated modification of gaas(110), si(100), and si(111)

B. Y. Han, Koji Nakayama, J. H. Weaver

Research output: Contribution to journalArticlepeer-review

36 Citations (Scopus)

Abstract

Scanning tunneling microscopy results show that irradiation with electrons of primary energies of 90–2000 eV created single-layer deep vacancies on GaAs(110), Si(100), and Si(111). The removal yield was linear with dose during the initial stages of surface modification, but it increased as the surface damage increased. The cross section varied with primary electron energy, increasing from (Formula presented) at 100 eV to (Formula presented) at 2000 eV for GaAs(110) and from (Formula presented) at 90 eV to (Formula presented) at 2000 eV for (Formula presented) The mechanisms responsible for atom displacement and desorption involve excitations in the surface region achieved by the cascade of inelastically scattered electrons. Processes involving long-lived localized states facilitate the coupling to the nuclear motion needed for atom displacement, with details that reflect surface reconstructions, surface states, and defect levels. Once surface defects have been created by electron irradiation of GaAs(110), they can be expanded by irradiation with photons of energy 2.3 eV. Photon irradiation involves site-selective desorption, and this allows patterning and atomic layer removal.

Original languageEnglish
Pages (from-to)13846-13853
Number of pages8
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume60
Issue number19
DOIs
Publication statusPublished - 1999 Jan 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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