Electromagnetic near field distribution measurements using optically scanning system

Masanori Takahashi, Katsumi Kawasaki, Hiroyasu Ohba, Tomokazu Ikenaga, Tatsuru Orikasa, Kazushi Ishiyama, Nobuyasu Adachi, Hiroyasu Ota, Ken Ichi Arai

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

An optically scanning electromagnetic field probe system, consisting of an electro-optic or magnetooptic crystal substrate and a galvano scanner, has been developed for the high speed, low-invasive measurement of electromagnetic near field distribution. We present some examples of electromagnetic field distribution measurements above a microstrip line using a LiNbO3 or a magnetic garnet crystal substrate and the probe system. We have also measured electromagnetic fields above a commercially available Ie using the system.

Original languageEnglish
Title of host publication2009 International Symposium on Electromagnetic Compatibility - EMC Europe
DOIs
Publication statusPublished - 2009 Nov 17
Event2009 International Symposium on Electromagnetic Compatibility - EMC Europe - Athens, Greece
Duration: 2009 Jun 112009 Jun 12

Publication series

Name2009 International Symposium on Electromagnetic Compatibility - EMC Europe

Other

Other2009 International Symposium on Electromagnetic Compatibility - EMC Europe
CountryGreece
CityAthens
Period09/6/1109/6/12

Keywords

  • Electro-optic effect
  • Electromagnetic field
  • Galvano scanner
  • Magneto-optic effect

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Electrical and Electronic Engineering
  • Communication

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