Abstract
Electroless (or chemical) deposition technique has been used in preparing Au island film electrodes on Si for in situ infrared spectroscopic studies of the electrochemical interface in attenuated total reflection mode. Owing to surface-enhanced infrared absorption (SEIRA) effect, absorption bands of molecules adsorbed on the chemically deposited films were one order of magnitude as large as those observed on smooth Au electrode surfaces. Although the enhancement factor was identical to that observed on vacuum evaporated Au island films, this simple method is superior to vacuum evaporation method with respect to the adhesion of the film, surface contamination, reproducibility, and cost.
| Original language | English |
|---|---|
| Pages (from-to) | 973-977 |
| Number of pages | 5 |
| Journal | Electrochemistry Communications |
| Volume | 4 |
| Issue number | 12 |
| DOIs | |
| Publication status | Published - 2002 Jan 1 |
| Externally published | Yes |
Keywords
- Adsorption
- Carbon monoxide
- Electroless deposition
- Gold
- Infraredspectroscopy
- P-Nitrobenzoic acid
ASJC Scopus subject areas
- Electrochemistry
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Cite this
Miyake, H., Ye, S., & Osawa, M. (2002). Electroless deposition of gold thin films on silicon for surface-enhanced infrared spectroelectrochemistry. Electrochemistry Communications, 4(12), 973-977. https://doi.org/10.1016/S1388-2481(02)00510-6