Electrochemical Properties of Fe-Cr-Mo Alloys and Fe2O3-Cr2O3-MoO2 Artificial Passivation Films in 1 M HCl

Katsuhisa Sugimoto, Mamoru Saito, Noboru Akao, Nobuyoshi Hara

Research output: Chapter in Book/Report/Conference proceedingChapter

4 Citations (Scopus)

Abstract

This chapter presents a study to analyze the composition of passive films formed on Fe-Cr-Mo alloys for the model of artificial passivation films, and to clear the effect of Mo content on the reductive dissolution of passive films on Fe-Cr-Mo alloys. It examines the effects of MoO2 content on the reductive dissolution of Fe2O3-Cr2O3-MoO2 films, which simulate passive films on Fe-Cr-Mo alloys, and also investigates the pitting inhibition mechanism of alloyed Mo in 1 M HCl. Anodic polarization curves of Fe-18Cr-xMo alloys showed that the alloys containing 5-10% Mo suffered from no pitting in 1 M HCl. The depassivation pH of the alloy depended on the Mo content, and indicated that the reductive dissolution of the passive film was suppressed by Mo. The thinning rate of Fe2O3-Cr2O3-MoO2 films as a function of potential showed that the reductive dissolution occurred on the films with low Cr and Mo cationic fractions in the potential range of pitting of the alloys. The film with the cationic fractions Xcr = 0.5 and XMO = 0.1, however, suffered from no reductive dissolution in 1 M HCl, and these cationic fractions coincided well with the composition of passive film on the Fe-18Cr-10Mo alloy.

Original languageEnglish
Title of host publicationPassivation of Metals and Semiconductors, and Properties of Thin Oxide Layers
PublisherElsevier
Pages3-8
Number of pages6
ISBN (Print)9780444522245
DOIs
Publication statusPublished - 2006 Dec 1

ASJC Scopus subject areas

  • Chemical Engineering(all)

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