Electrochemical fluorine source for ultrahigh vacuum dosing

Koji S. Nakayama; T. Sakurai; J. H. Weaver

Electrochemical fluorine source for ultrahigh vacuum dosing

Koji S. Nakayama, T. Sakurai, J. H. Weaver

New Industry Creation Hatchery Center (NICHe)

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

A solid state electrochemical source was built that allows fluorine dosing at pressures below 8 × 10^-11Torr. The cell consists of a CaF₂ crystal that is clamped between two Au plates that function as the cathode and anode. An applied voltage at elevated temperature produces an ionic current due to fluorine migration to the anode where it desorbs. This cell allows submonolayer halogen exposures, and it is ideal for studies of halogen etching because it minimizes degradation of the vacuum system and avoids toxic chemicals.

Original language	English
Pages (from-to)	2606-2607
Number of pages	2
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	18
Issue number	5
Publication status	Published - 2000 Sep 1

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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AB - A solid state electrochemical source was built that allows fluorine dosing at pressures below 8 × 10-11Torr. The cell consists of a CaF2 crystal that is clamped between two Au plates that function as the cathode and anode. An applied voltage at elevated temperature produces an ionic current due to fluorine migration to the anode where it desorbs. This cell allows submonolayer halogen exposures, and it is ideal for studies of halogen etching because it minimizes degradation of the vacuum system and avoids toxic chemicals.

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