Electrochemical fluorine source for ultrahigh vacuum dosing

Koji S. Nakayama, T. Sakurai, J. H. Weaver

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

A solid state electrochemical source was built that allows fluorine dosing at pressures below 8 × 10-11Torr. The cell consists of a CaF2 crystal that is clamped between two Au plates that function as the cathode and anode. An applied voltage at elevated temperature produces an ionic current due to fluorine migration to the anode where it desorbs. This cell allows submonolayer halogen exposures, and it is ideal for studies of halogen etching because it minimizes degradation of the vacuum system and avoids toxic chemicals.

Original languageEnglish
Pages (from-to)2606-2607
Number of pages2
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume18
Issue number5
Publication statusPublished - 2000 Sep 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Electrochemical fluorine source for ultrahigh vacuum dosing'. Together they form a unique fingerprint.

Cite this