Electrochemical fluorine source for ultrahigh vacuum dosing

Koji S. Nakayama; T. Sakurai; J. H. Weaver

Electrochemical fluorine source for ultrahigh vacuum dosing

Koji S. Nakayama, T. Sakurai, J. H. Weaver

Research output: Contribution to journal › Article › peer-review

Abstract

A solid state electrochemical source was built that allows fluorine dosing at pressures below 8 × 10^-11Torr. The cell consists of a CaF₂ crystal that is clamped between two Au plates that function as the cathode and anode. An applied voltage at elevated temperature produces an ionic current due to fluorine migration to the anode where it desorbs. This cell allows submonolayer halogen exposures, and it is ideal for studies of halogen etching because it minimizes degradation of the vacuum system and avoids toxic chemicals.

Original language	English
Pages (from-to)	2606-2607
Number of pages	2
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	18
Issue number	5
Publication status	Published - 2000 Sep
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Cite this

@article{400fb5bca62a4e01a1cb4fcf82b6fd8f,

title = "Electrochemical fluorine source for ultrahigh vacuum dosing",

abstract = "A solid state electrochemical source was built that allows fluorine dosing at pressures below 8 × 10-11Torr. The cell consists of a CaF2 crystal that is clamped between two Au plates that function as the cathode and anode. An applied voltage at elevated temperature produces an ionic current due to fluorine migration to the anode where it desorbs. This cell allows submonolayer halogen exposures, and it is ideal for studies of halogen etching because it minimizes degradation of the vacuum system and avoids toxic chemicals.",

author = "Nakayama, {Koji S.} and T. Sakurai and Weaver, {J. H.}",

year = "2000",

month = sep,

language = "English",

volume = "18",

pages = "2606--2607",

journal = "Journal of Vacuum Science and Technology A",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "5",

}

TY - JOUR

T1 - Electrochemical fluorine source for ultrahigh vacuum dosing

AU - Nakayama, Koji S.

AU - Sakurai, T.

AU - Weaver, J. H.

PY - 2000/9

Y1 - 2000/9

N2 - A solid state electrochemical source was built that allows fluorine dosing at pressures below 8 × 10-11Torr. The cell consists of a CaF2 crystal that is clamped between two Au plates that function as the cathode and anode. An applied voltage at elevated temperature produces an ionic current due to fluorine migration to the anode where it desorbs. This cell allows submonolayer halogen exposures, and it is ideal for studies of halogen etching because it minimizes degradation of the vacuum system and avoids toxic chemicals.

AB - A solid state electrochemical source was built that allows fluorine dosing at pressures below 8 × 10-11Torr. The cell consists of a CaF2 crystal that is clamped between two Au plates that function as the cathode and anode. An applied voltage at elevated temperature produces an ionic current due to fluorine migration to the anode where it desorbs. This cell allows submonolayer halogen exposures, and it is ideal for studies of halogen etching because it minimizes degradation of the vacuum system and avoids toxic chemicals.

UR - http://www.scopus.com/inward/record.url?scp=26444599713&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=26444599713&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:26444599713

VL - 18

SP - 2606

EP - 2607

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 5

ER -

Electrochemical fluorine source for ultrahigh vacuum dosing

Abstract

ASJC Scopus subject areas

UN SDGs

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